AI-optimization is exposing HR’s operational blind spots

When workflows speed up, outdated systems start to show their age. Here are the questions HR leaders should ask.
IEEE

Meta-Optimized LDMOS Process–Device Co-Optimization: Extrapolation-Enhanced Modeling With Wafer-Level Validation

Abstract: Accurate and efficient modeling of lateral double-diffused MOS (LDMOS) devices is critical for process optimization and reliability analysis, especially under limited simulation budgets.
IEEE

Fast Mask Optimization Under Process Variation Using Guided Local Search on Quadratic Programming

Abstract: In advanced optical lithography, it is critical to obtain a mask with high fidelity to a target pattern and strong tolerance to process variation within a short time. This article formulates ...